The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Feb. 21, 2008
Applicants:
Galen L. Pfeiffer, Lincoln, NE (US);
Martin M. Liphardt, Lincoln, NE (US);
James N. Hilfiker, Lincoln, NE (US);
Inventors:
Galen L. Pfeiffer, Lincoln, NE (US);
Martin M. Liphardt, Lincoln, NE (US);
James N. Hilfiker, Lincoln, NE (US);
Assignee:
J.A. Woollam Co., Inc., Lincoln, NE (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed is a system for controlling focus, angle of incidence and intensity of an electromagnetic beam over a spectrum of wavelengths, and methodology for optimizing investigation of samples which demonstrate low specular reflectance and/or are depolarizing of a polarized beam of electromagnetic radiation, such as solar cells.
Pfeiffer, Galen. (2010). System for controlling intensity of a beam of electromagnetic radiation and method for investigating materials with low specular reflectance and/or are depolarizing (U.S. Patent No. 7821637). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7821637
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile