The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
May. 11, 2007
Dae Ik Kim, Fishkill, NY (US);
Jonghae Kim, Fishkill, NY (US);
Moon Ju Kim, Wappingers Falls, NY (US);
Choongyeun Cho, Hopewell Junction, NY (US);
Dae Ik Kim, Fishkill, NY (US);
Jonghae Kim, Fishkill, NY (US);
Moon Ju Kim, Wappingers Falls, NY (US);
Choongyeun Cho, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Back end of line (BEOL) circuit structures and methods are provided for blocking externally-originating or internally-originating electromagnetic interference. One such BEOL circuit structure includes one or more semiconductor substrates supporting one or more integrated circuits, and one or more BEOL layers disposed over the semiconductor substrate(s). At least one BEOL layer includes a conductive pattern defined at least partially by a plurality of elements arrayed in a first direction and a second direction throughout at least a portion thereof. The plurality of elements are sized and positioned in at least one of the first and second directions to block electromagnetic interference of a particular wavelength from passing therethrough. In one implementation, a first conductive pattern of a first BEOL layer polarizes electromagnetic interference, and a second conductive pattern of a second BEOL layer blocks the polarized electromagnetic interference.