The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7820358 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 26, 2010

Filed:

Jul. 04, 2007
Applicants:

Andreas Woerz, Kelheim, DE;

Erwin Steinkirchner, Straubing, DE;

Inventors:

Andreas Woerz, Kelheim, DE;

Erwin Steinkirchner, Straubing, DE;

Assignee:

Infineon Technologies AG, Neubiberg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G03F 7/20 (2006.01); G03F 7/40 (2006.01);
U.S. Cl.
CPC ...
Abstract

An apparatus includes a substrate and a photoresist material structure arranged adjacent to the substrate so that a cavity is formed between the substrate and the photoresist material structure. The cavity has an opening. The photoresist material structure includes a frame portion disposed on a main side of the substrate and a cap portion spanning over a part of the main side of the substrate at a distance to the main side. The cap portion is formed in the first photoresist layer and the frame portion is formed in the second photoresist layer.


Find Patent Forward Citations

Woerz, Andreas. (2010). Photo-resist material structure and method of producing the same (U.S. Patent No. 7820358). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7820358

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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