The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 26, 2010

Filed:

Aug. 04, 2006
Applicants:

Keishin Yamazaki, Takaoka, JP;

Iwao Nakamura, Imizu, JP;

Ryota Sasajima, Toyama, JP;

Inventors:

Keishin Yamazaki, Takaoka, JP;

Iwao Nakamura, Imizu, JP;

Ryota Sasajima, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/26 (2006.01); B01J 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

To provide a substrate treatment apparatus capable of performing temperature control in a reaction tube with accuracy. A substrate treatment apparatusincludes: a reaction tubefor treating a substrate; a heaterfor heating the substratein the reaction tube; a cooling air channelfor circulating cooling airoutside the reaction tube; and a thermocouplefor detecting temperature around the reaction tube. The thermocoupleis disposed in the cooling air channelfor circulating cooling airin a state where the thermocoupleis covered with a protection tube, and a coverfor intercepting flow toward the protection tubeof the cooling airis disposed outside the protection tube


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