The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Jun. 28, 2004
Carole Baubet, Aachen, DE;
Klaus Fischer, Alsdorf, DE;
Marcus Loergen, Herzogenrath, DE;
Jean Christophe Giron, Aachen, DE;
Nicolas Nadaud, Gentilly, FR;
Eric Mattman, Paris, FR;
Jean Paul Rousseau, Boulogne, FR;
Alfred Hofrichter, Aachen, DE;
Manfred Jansen, Geilenkirchen, DE;
Carole Baubet, Aachen, DE;
Klaus Fischer, Alsdorf, DE;
Marcus Loergen, Herzogenrath, DE;
Jean Christophe Giron, Aachen, DE;
Nicolas Nadaud, Gentilly, FR;
Eric Mattman, Paris, FR;
Jean Paul Rousseau, Boulogne, FR;
Alfred Hofrichter, Aachen, DE;
Manfred Jansen, Geilenkirchen, DE;
Saint-Gobain Glass France, Courbevoie, FR;
Abstract
The invention relates to a substrate (), especially a glass substrate, coated with at least one dielectric thin-film layer deposited by sputtering, especially magnetically enhanced sputtering and preferably reactive sputtering in the presence of oxygen and/or nitrogen, with exposure to at least one ion beam () coming from an ion source (), characterized in that said dielectric layer exposed to the ion beam has a refractive index that can be adjusted according to the parameters of the ion source, said ion source being a linear source.