The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Sep. 28, 2005
Toshio Fujita, Tokyo, JP;
Huaipeng Tang, Tokyo, JP;
Akihiro Seta, Tokyo, JP;
Minoru Okuda, Machida, JP;
Kazuhiro Hashigucci, Yokohama, JP;
Kimihiro Okubo, Tokyo, JP;
Toshio Fujita, Tokyo, JP;
Huaipeng Tang, Tokyo, JP;
Akihiro Seta, Tokyo, JP;
Minoru Okuda, Machida, JP;
Kazuhiro Hashigucci, Yokohama, JP;
Kimihiro Okubo, Tokyo, JP;
Shinryo Corporation, Tokyo, JP;
Abstract
An antigen exposure chamber for quickly performing cleaning and drying with high quality is provided. The antigen exposure chamber of the present invention includes: a cleaning water supply device for supplying cleaning water for cleaning the antigen exposure chamber; cleaning nozzles for jetting the cleaning water supplied from the cleaning water supply device into the antigen exposure chamber and ducts of fan units to clean the antigen exposure chamber and the ducts; a floor surface of the antigen exposure chamber; and an exhaust device provided below the floor surface to exhaust air from the floor surface of the antigen exposure chamber and collect and drain the cleaning water during cleaning.