The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Jan. 31, 2005
Benjamin Chen, San Jose, CA (US);
Yun-fei LI, Fremont, CA (US);
Hugh C. Hiner, Fremont, CA (US);
Wei Zhang, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Benjamin Chen, San Jose, CA (US);
Yun-Fei Li, Fremont, CA (US);
Hugh C. Hiner, Fremont, CA (US);
Wei Zhang, Fremont, CA (US);
Yingjian Chen, Fremont, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
A method and system for providing a magnetic structure that includes at least one magnetic material is disclosed. The method and system include defining the magnetic structure. The magnetic structure also includes a top layer that is insensitive to an istroropic carbonyl reactive ion etch. The defining of the magnetic structure results in at least one artifact. The method and system further includes cleaning the at least one artifact using at least one isotropic carbonyl reactive ion etch.