The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Feb. 07, 2007
Toshiko Hosoda, Chino, JP;
Shinichi Yotsuya, Chino, JP;
Toshiko Hosoda, Chino, JP;
Shinichi Yotsuya, Chino, JP;
Seiko Epson Corporation, Tokyo, JP;
Abstract
A process for producing an emissive device that includes (1) feeding the first material to the first region and the third region and to a side adjacent to a first face of at least one first electrode by a gas-phase process with a first mask to form films; (2) feeding the second material to the second region and the third region such that the second material fed in the third region is stacked above the first material in the third region and to the side adjacent to the first face of each first electrode by a gas-phase process to form the emissive layers; and (3) forming a second electrode at a side of each emissive layer opposite the side adjacent to the first electrode.