The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 26, 2010
Filed:
Dec. 07, 2005
Hamid Balamame, Palo Alto, CA (US);
Daniel Wayne Bedell, Gilroy, CA (US);
Mary Kathryn Gutberlet, Prunedale, CA (US);
Clarence Kai-sheng Hsieh, Santa Barbara, CA (US);
Aron Pentek, San Jose, CA (US);
Yi Zheng, San Ramon, CA (US);
Hamid Balamame, Palo Alto, CA (US);
Daniel Wayne Bedell, Gilroy, CA (US);
Mary Kathryn Gutberlet, Prunedale, CA (US);
Clarence Kai-Sheng Hsieh, Santa Barbara, CA (US);
Aron Pentek, San Jose, CA (US);
Yi Zheng, San Ramon, CA (US);
Hitachi Global Storage Technologies Netherlands B.V., Amsterdam, NL;
Abstract
A method of manufacturing a magnetic write head that provides improved pole critical dimension control, such as improved track width control (improved sigma) and improved flare point control. The method involves a combination of several process improvements, such as photolithographically patterning a Ppole tip defining photoresist frame using a zero print bias and also using a small flash field. The method also involves the use of a non-reactive ion etch to notch the first pole (P) using the second pole (P) as a mask.