The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Sep. 05, 2006
Atsushi Sagisaka, Kawasaki, JP;
Tatsuo Chijimatsu, Kawasaki, JP;
Atsushi Sagisaka, Kawasaki, JP;
Tatsuo Chijimatsu, Kawasaki, JP;
Fujitsu Semiconductor Limited, Yokohama, JP;
Abstract
Circuit-pattern-data correction method and semiconductor-device manufacturing method which prevent excessive correction from being made when model-based proximity-effect correction (OPC) is applied to a corrected circuit pattern, the excessive correction being caused by a step (difference in level) close to a circuit-pattern corner in the corrected circuit pattern, and the step being produced when rule-base OPC is applied. The rule-based OPC is applied to input design data in step S; a step close to a circuit-pattern corner, produced by the rule-based OPC is detected in step S; the step is removed in step S; and the model-based OPC is applied and exposure data is generated in step S