The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2010

Filed:

Oct. 25, 2007
Applicants:

Fengfeng Tao, Clifton Park, NY (US);

Seyed Gholamali Saddoughi, Clifton Park, NY (US);

Robert Carl Murray, Rotterdam, NY (US);

Abdelkrim Younsi, Ballston Lake, NY (US);

Steven Martens, Ballston Lake, NY (US);

Inventors:

Fengfeng Tao, Clifton Park, NY (US);

Seyed Gholamali Saddoughi, Clifton Park, NY (US);

Robert Carl Murray, Rotterdam, NY (US);

Abdelkrim Younsi, Ballston Lake, NY (US);

Steven Martens, Ballston Lake, NY (US);

Assignee:

General Electric Company, Niskayuna, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H02H 7/20 (2006.01); H03K 3/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A plasma generation system includes a pulse generator having at least one switch and that is configured to convert a DC voltage to a desired high frequency, high breakdown voltage pulse sufficient to break down a high-breakdown voltage gap, wherein all pulse generator switches are solely low to medium voltage, high frequency switches, and further configured to apply the breakdown voltage to a plasma load for the generation of plasma. In one application, the plasma generation system is useful to manipulate the flow of jets and provide highly efficient acoustic noise reduction.


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