The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Mar. 17, 2008
Carey King, Austin, TX (US);
Carey King, Austin, TX (US);
Rambus International Ltd., Grand Cayman, KY;
Abstract
An electromechanical dynamic force profile articulating mechanism for recovering or emulating true parallel plate capacitor actuation behaviors from deformable membranes used in MEMS systems. The curved deformation of flexible membranes causes their MEMS behavior to deviate from known interactions between rigid plates that maintain geometric parallelism during ponderomotive actuation. The present invention teaches three methods for reacquiring parallel plate behavior: superaddition or in situ integration of a rigid region within or upon the deformable MEMS membrane; creation of isodyne regions to secure parallelism by altering the force profile upon the membrane by introducing tuned and shaped voids within the conductive region associated with the membrane; and a hybrid composite approach wherein the conductive region is deposited after deposition of a raised rigid zone, thereby emulating isodyne behavior due to the increased inter-conductor distance in the vicinity of the rigid zone, in conjunction with rigidity benefits stemming directly from said zone.