The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Oct. 22, 2008
Method of implanting ion species into microstructure products by concurrently cleaning the implanter
Applicants:
Christian Krueger, Liegau-Augustusbad, DE;
Rastislav Kocis, Radebeul, DE;
Marek Braun, Dresden, DE;
Niels-wieland Hauptmann, Moritzburg, DE;
Heinz Seidel, Zeithain, DE;
Inventors:
Christian Krueger, Liegau-Augustusbad, DE;
Rastislav Kocis, Radebeul, DE;
Marek Braun, Dresden, DE;
Niels-Wieland Hauptmann, Moritzburg, DE;
Heinz Seidel, Zeithain, DE;
Assignee:
Advanced Micro Devices, Inc., Austin, TX (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/08 (2006.01); H01J 49/10 (2006.01);
U.S. Cl.
CPC ...
Abstract
By operating an implantation tool with a source gas having a halogen fraction of 66 atomic percent or less relative to the total composition of the source gas, an in situ cleaning effect may be achieved while performing an implantation process.