The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 19, 2010

Filed:

Feb. 12, 2007
Applicants:

Kei Hiruma, Chino, JP;

Osamu Kasuga, Suwa, JP;

Yuji Iwata, Suwa, JP;

Inventors:

Kei Hiruma, Chino, JP;

Osamu Kasuga, Suwa, JP;

Yuji Iwata, Suwa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/469 (2006.01); H01L 21/44 (2006.01);
U.S. Cl.
CPC ...
Abstract

A deposit forming method including ejecting droplets of a deposit forming material onto a substrate, thereby forming a deposit by the droplets on the substrate, is provided. The droplets are ejected along a direction inclined at a predetermined angle in a predetermined direction with respect to a normal line of the substrate and at a predetermined pitch in the predetermined direction. The predetermined angle is set in correspondence with the diameter of each of the droplets and the predetermined pitch in such a manner that the dimension of a dot formed by each droplet on the substrate in the predetermined direction becomes greater than or equal to the predetermined pitch.


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