The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Aug. 23, 2006
Applicants:
Tatsuo Muraoka, Kawasaki, JP;
Kazunori Kobayashi, Kawasaki, JP;
Inventors:
Tatsuo Muraoka, Kawasaki, JP;
Kazunori Kobayashi, Kawasaki, JP;
Assignee:
Fujitsu Semiconductor Limited, Yokohama, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
A film-forming method for forming a metal film on a substrate by a sputtering process includes the steps of depressurizing a processing space, in which deposition of the metal film is caused by the sputtering process, applying a DC bias voltage between the substrate and a target disposed in the processing space so as to face the substrate, and igniting plasma by introducing secondary electrons to the processing space from a secondary electron source.