The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Dec. 02, 2008
Applicants:
Toshihiko Tsukatani, Tokyo, JP;
Masaru Konya, Tokyo, JP;
Noriaki Hamaya, Tokyo, JP;
Hajime Nakano, Tokyo, JP;
Takao Maeda, Tokyo, JP;
Inventors:
Toshihiko Tsukatani, Tokyo, JP;
Masaru Konya, Tokyo, JP;
Noriaki Hamaya, Tokyo, JP;
Hajime Nakano, Tokyo, JP;
Takao Maeda, Tokyo, JP;
Assignee:
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B32B 9/04 (2006.01); B32B 9/06 (2006.01); B32B 13/04 (2006.01);
U.S. Cl.
CPC ...
Abstract
A wafer has a rare earth fluoride coating disposed, typically sprayed on a substrate as an outermost layer, the rare earth fluoride being selected from lanthanoid fluorides, yttrium fluoride, and scandium fluoride. It is useful as a dummy wafer in a plasma etching or deposition system.