The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Mar. 14, 2003
Bhushan L. Sopori, Denver, CO (US);
Bhushan L. Sopori, Denver, CO (US);
Alliance for Sustainable Energy, LLC, Golden, CO (US);
Abstract
Various exemplary methods () are directed to determining wafer thickness and/or wafer surface characteristics. An exemplary method () includes measuring reflectance of a wafer and comparing the measured reflectance to a calculated reflectance or a reflectance stored in a database. Another exemplary method () includes positioning a wafer on a reflecting support to extend a reflectance range. An exemplary device () has an input (), analysis modules (-) and optionally a database (). Various exemplary reflectometer chambers () include radiation sources positioned at a first altitudinal angle () and at a second altitudinal angle (). An exemplary method includes selecting radiation sources positioned at various altitudinal angles. An exemplary element () includes a first aperture () and a second aperture () that can transmit reflected radiation to a fiber and an imager, respectfully.