The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Dec. 17, 2007
Hylke Veenstra, Reuver, NL;
Jaap J. Mattheijer, Rosmalen, NL;
Matheus Wijnstekers, Velden, NL;
Joseph L. M. Nelissen, Venlo, NL;
Hylke Veenstra, Reuver, NL;
Jaap J. Mattheijer, Rosmalen, NL;
Matheus Wijnstekers, Velden, NL;
Joseph L. M. Nelissen, Venlo, NL;
OCE-Technologies B.V., Venlo, NL;
Abstract
A method for adjusting a first and a second array relative to each other in a printing device has a carrying structure for mounting the first and second arrays. The first array has nozzles arranged in a first row substantially parallel to a first direction for forming first marks on a recording substrate. The second array has nozzles arranged in a second row substantially parallel to the first direction for forming second marks on the recording substrate. In an attainable relative position, the first and second arrays at least partially flank each other. The method includes forming a test pattern and detecting the locations of first and second test marks; determining a plurality of deviation factors for a plurality of attainable relative positions; and selecting an attainable relative position among the plurality of attainable relative positions that satisfies a selection criterion applied to the plurality of deviation factors.