The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 19, 2010
Filed:
Feb. 24, 2006
Liang Liu, Beijing, CN;
Shuai-ping GE, Beijing, CN;
Zhao-fu HU, Beijing, CN;
Bing-chu Du, Beijing, CN;
Cai-lin Guo, Beijing, CN;
Pi-jin Chen, Beijing, CN;
Shou-shan Fan, Beijing, CN;
Liang Liu, Beijing, CN;
Shuai-Ping Ge, Beijing, CN;
Zhao-Fu Hu, Beijing, CN;
Bing-Chu Du, Beijing, CN;
Cai-Lin Guo, Beijing, CN;
Pi-Jin Chen, Beijing, CN;
Shou-Shan Fan, Beijing, CN;
Tsinghua University, Beijing, CN;
Hon Hai Precision Industry Co., Ltd., Tu-Cheng, Taipei Hsien, TW;
Abstract
A reference leak () includes a first substrate (), a second substrate () disposed and bonded on the first substrate, and predetermined numbers of leak channels () defined in at least one of the first and second substrates. Oblique walls of the leak channels are formed by crystal planes of the at least one of the first and second substrates, the oblique walls thereby being aligned according to such crystal planes. A method for making a reference leak is also provided.