The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Oct. 19, 2006
Elida Isabel DE Obaldia, Dallas, TX (US);
Robert B. Staszewski, Garland, TX (US);
Dirk Leipold, Plano, TX (US);
Elida Isabel de Obaldia, Dallas, TX (US);
Robert B. Staszewski, Garland, TX (US);
Dirk Leipold, Plano, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
A novel method and apparatus for defining process variation in a digital RF processor (DRP). The invention is well suited for use in highly integrated system on a chip (SoC) radio solutions that incorporate a very large amount of digital logic circuitry. The method and apparatus provide direct measurement of fabrication process variation in circuits without requiring any additional test equipment by utilizing a time to digital converter (TDC) circuit already present in the chip. The TDC circuit relies on the time delay in an inverter chain to sample a high speed CKV clock using a slow FREF clock. Calculation of inverse time provides a direct correlation for fabrication process variation in each die.