The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Oct. 21, 2008
Yoshiaki Kawato, Sendai, JP;
Kazuhiro Nakamoto, Odawara, JP;
Hiroyuki Hoshiya, Odawara, JP;
Yasuyuki Okada, Odawara, JP;
Masafumi Mochizuki, Koganei, JP;
Yoshiaki Kawato, Sendai, JP;
Kazuhiro Nakamoto, Odawara, JP;
Hiroyuki Hoshiya, Odawara, JP;
Yasuyuki Okada, Odawara, JP;
Masafumi Mochizuki, Koganei, JP;
Hitachi Global Storage Technologies Japan, Ltd., Kanagawa, JP;
Abstract
Thin film perpendicular magnetic head with a narrow main pole capable of a high recording density in excess of 100 gigabits per square inch and generating a high magnetic recording field, while also being modified to suppress remanent magnetic fields occurring immediately after writing operation. A return path is provided for supplying a magnetic flux to the main pole, and an conductive coil for excitation of the main pole and return path. The main pole has a pole width of 200 nanometers or less, and a magnetic multilayer made up of a high saturation flux density layer and low saturation flux density layer. The low saturation flux density layer and the high saturation flux density suppress remanent magnetization and prevent erasing after writing by utilizing a closed magnetic domain structure in the pole.