The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Aug. 30, 2007
Yoshinori Iketaki, Oume, JP;
Yoshinori Iketaki, Oume, JP;
Olympus Corporation, Tokyo, JP;
Abstract
The present invention provides a microscopy method and a microscope, which enable microscopic observation of desired information of a specimen with an extremely high S/N ratio in a short period of time without increasing intensity of a light sources. The method of the invention is characterized in that it comprises: a simultaneous irradiation step of irradiating a specimen with first and second electromagnetic rays having different wave length with the rays overlapping at least partly each other; and a simultaneous irradiation visualization step of visualizing a spatial distribution of a refractive index variation caused by the irradiation of the first electromagnetic ray as a phase contrast image of the second electromagnetic ray having passed through the specimen in the region of the specimen to which the overlapped the first and the second electromagnetic rays are irradiated.