The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Jul. 03, 2006
Masayuki Shiraishi, Kumagaya, JP;
Masayuki Shiraishi, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An exposure apparatus that exposes an object to be exposed with light from an EUV light source. The light has an exposure wavelength component and a non-exposure wavelength component. The exposure apparatus has a detector that independently detects the quantity of light of the exposure wavelength component and the quantity of light of the non-exposure wavelength component of the light. Therefore, for example, even if the quantity of light of the exposure wavelength component and the quantity of light of the non-exposure wavelength component individually fluctuate, it is possible to accurately ascertain fluctuations in the characteristics of the optical system resulting from irradiation heat. As a result, it is also possible to achieve a high performance mirror adjustment system.