The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Mar. 12, 2004
Godo Sakamoto, Otsu, JP;
Tooru Kitagawa, Otsu, JP;
Yasuo Ohta, Otsu, JP;
Yasunori Fukushima, Otsu, JP;
Hiroki Murase, Otsu, JP;
Godo Sakamoto, Otsu, JP;
Tooru Kitagawa, Otsu, JP;
Yasuo Ohta, Otsu, JP;
Yasunori Fukushima, Otsu, JP;
Hiroki Murase, Otsu, JP;
Toyo Boseki Kabushiki Kaisha, Osaka-Shi, JP;
Abstract
To provide a novel high strength polyethylene multifilament which consists of a plurality of filaments having high strengths and uniform internal structures, and showing a narrow variation in the strengths of the monofilaments, and which has been difficult to be provided by the conventional gel spinning method. A high strength polyethylene multifilament consisting of a plurality of filaments which are characterized in that the crystal size of monoclinic crystal is 9 nm or less; the stress Raman shift factor is −5.0 cm/(cN/dTex) or more; the average strength is 20 CN/dTex or higher; the knot strength retention of each monofilament is 40% or higher; CV indicating a variation in the strengths of the monofilaments is 25% or lower; the elongation at break is from 2.5% inclusive to 6.0% inclusive; the fineness of each filament is 10 dTex or less; and the melting point of the filaments is 145° C. or higher.