The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 12, 2010
Filed:
Mar. 19, 2007
Hiraku Hirabayashi, Chuo-ku, JP;
Yohei Koyanagi, Chuo-ku, JP;
Hiraku Hirabayashi, Chuo-ku, JP;
Yohei Koyanagi, Chuo-ku, JP;
TDK Corporation, Tokyo, JP;
Abstract
A manufacturing method of a thin-film element having a lower layer with a narrower width is provided, which comprises steps of: forming a first film and a second film on the first film; forming a second layer having a width Wobtained by trimming the second film; forming a mask film having a smaller etching rate than the first film so as to cover the second layer; forming a pattern having a width Wlarger than the width W, obtained by collectively trimming the mask film covering the second layer and at least an upper portion of the first film; and forming a first layer having a width Wsmaller than the width Wor having a portion with a width Wsmaller than the width W, obtained by trimming the first film without changing the width Wof the second layer.