The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 2010

Filed:

Jul. 01, 2008
Applicants:

Chun-hung Huang, Hsinchu County, TW;

Ming-lang Chang, Hsinchu County, TW;

Yen-chia Peng, Tainan, TW;

Tsang-fang Jeng, Hsinchu, TW;

Tzu-hsin Kuo, Taipei County, TW;

Inventors:

Chun-Hung Huang, Hsinchu County, TW;

Ming-Lang Chang, Hsinchu County, TW;

Yen-Chia Peng, Tainan, TW;

Tsang-Fang Jeng, Hsinchu, TW;

Tzu-Hsin Kuo, Taipei County, TW;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G05D 7/00 (2006.01); G06F 19/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A protection gas control method for a non-sealed process chamber including the steps of activating a protection gas control apparatus while coupling a protection gas to a plurality of throttle valves, opening all the throttle valves for a pre-determined period of time, closing at least one of the throttle valves if the oxygen concentration in the chamber is smaller than or equal to a first target value, determining whether the oxygen concentration in the chamber is smaller than or equal to a second target value, and stopping supplying the protection gas when the temperature of the chamber is lower than a pre-determined temperature.


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