The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
May. 16, 2006
Wentao T. LU, Malden, MA (US);
Srinivas Sridhar, Newton, MA (US);
Plarenta Vodo, Malden, MA (US);
Patanjali Parimi, Belmont, MA (US);
Yongjian Huang, Malden, MA (US);
Wentao T. Lu, Malden, MA (US);
Srinivas Sridhar, Newton, MA (US);
Plarenta Vodo, Malden, MA (US);
Patanjali Parimi, Belmont, MA (US);
Yongjian Huang, Malden, MA (US);
Northeastern University, Boston, MA (US);
Abstract
Negative refraction in photonic crystals and diffraction grating is used to design plano-concave lenses to focus plane waves. Microwave experiments are carried out to demonstrate negative refraction and the performance of these lenses. Demonstration of negative refraction of visible light is also performed for the grism. These lenses can be used in optical circuits, astronomical applications, etc.