The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Feb. 09, 2005
Edward Fadel, Durham, NC (US);
Robert P. Freese, Chapel Hill, NC (US);
Richard N. Gardner, Raleigh, NC (US);
Michele E. Nuzum, Morrisville, NC (US);
David L. Reed, Chapel Hill, NC (US);
Thomas A. Rinehart, Durham, NC (US);
Robert L. Wood, Apex, NC (US);
Edward Fadel, Durham, NC (US);
Robert P. Freese, Chapel Hill, NC (US);
Richard N. Gardner, Raleigh, NC (US);
Michele E. Nuzum, Morrisville, NC (US);
David L. Reed, Chapel Hill, NC (US);
Thomas A. Rinehart, Durham, NC (US);
Robert L. Wood, Apex, NC (US);
Tredegar Newco, Inc., Richmond, VA (US);
Abstract
Microlens arrays include a substrate, an array of microlenses on a first side of the substrate and an aperture mask on a second side of the substrate. The aperture mask includes an array of apertures at optical axes of the lenses. A second array of apertures may be included in the aperture mask at randomized positions therein. The randomized apertures may be provided in the aperture mask by providing a diffusive layer between the aperture mask and the substrate, and directing coherent radiation through the lens array, the diffusive layer and aperture mask.