The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
May. 05, 2008
James D. Bernstein, Plano, TX (US);
Lance S. Robertson, Rockwall, TX (US);
Said Ghneim, Richardson, TX (US);
Jiejie Xu, Plano, TX (US);
Jeffrey Loewecke, Wylie, TX (US);
James D. Bernstein, Plano, TX (US);
Lance S. Robertson, Rockwall, TX (US);
Said Ghneim, Richardson, TX (US);
Jiejie Xu, Plano, TX (US);
Jeffrey Loewecke, Wylie, TX (US);
Texas Instruments Incorporated, Dallas, TX (US);
Abstract
The present invention provides a method for implanting charged particles in a substrate and a method for manufacturing an integrated circuit. The method for implanting charged particles in a substrate, among other steps, includes projecting a beam of charged particles () to a substrate (), the beam of charged particles () having a given beam divergence; and forming a diverged beam of charged particles () by subjecting the beam of charged particles () to an energy field (), thereby causing the beam of charged particles () to have a larger beam divergence. The method then desires implanting the diverged beam of charged particles () into the substrate ().