The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7807514 B1

PDF
Full Text
Expired
Date of Patent:
Oct. 05, 2010

Filed:

Apr. 26, 2006
Applicants:

Christopher Parks, Rochester, NY (US);

John P. Mccarten, Penfield, NY (US);

Joseph R. Summa, Hilton, NY (US);

Inventors:

Christopher Parks, Rochester, NY (US);

John P. McCarten, Penfield, NY (US);

Joseph R. Summa, Hilton, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/339 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming a charge-coupled device including the steps of forming well or substrate of a first conductivity type; a buried channel of a second conductivity type; a plurality of first gate electrodes; partially coating the first gate electrodes with a mask substantially aligned to an edge of the first gate electrodes; implanting ions of the first conductivity type of sufficient energy to penetrate the first gates and into the buried channel; and a plurality of second gate electrodes covering regions each over the buried channel between the first gate electrodes.


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