The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 05, 2010

Filed:

Mar. 13, 2007
Applicant:

Javier Garcia-martinez, Alicante, ES;

Inventor:

Javier Garcia-Martinez, Alicante, ES;

Assignee:

Rive Technology, Inc., Cambridge, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 29/06 (2006.01); C01B 33/36 (2006.01);
U.S. Cl.
CPC ...
Abstract

A quantity of solution sufficient to dissolve a pH controlling substance and/or substantially dissolve a surfactant without substantial excess solution is controlled under a set of time and temperature conditions to transform an inorganic material having long-range crystallinity to a mesostructure having long-range crystallinity. The method employs concentrated conditions that have a consistency similar to a thick slurry. The economic viability of scaling up such thick slurry methods is improved relative to prior more dilute methods of transforming an inorganic material to a mesostructure.


Find Patent Forward Citations

Loading…