The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Dec. 07, 2006
Toshinobu Tokita, Yokohama, JP;
Hirohisa Ota, Kawagoe, JP;
Eigo Kawakami, Utsunomiyua, JP;
Kazuyuki Kasumi, Utsunomiyua, JP;
Toshinobu Tokita, Yokohama, JP;
Hirohisa Ota, Kawagoe, JP;
Eigo Kawakami, Utsunomiyua, JP;
Kazuyuki Kasumi, Utsunomiyua, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
A processing method for forming a first pattern on a substrate to which a resist is applied includes the steps of pressing an original having a second pattern that has a relief reverse to that of the first pattern, against the resist on the substrate, and irradiating light onto the resist via the original, wherein a size of a concave of the second pattern is greater than a size of a convex of the first pattern corresponding to the concave of the second pattern, and a size of a convex of the second pattern is smaller than a size of a concave of the first pattern corresponding to the convex of the second pattern.