The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Sep. 09, 2003
Pierre Fayet, Lausanne, CH;
Bertrand Jaccoud, Siviriez, CH;
Pierre Fayet, Lausanne, CH;
Bertrand Jaccoud, Siviriez, CH;
Tetra Laval Holdings & Finance S.A., Pully, CH;
Abstract
A device for treating a web material in a continuous plasma enhanced process includes a vacuum chamber () with device () for maintaining a constant reduced pressure within the chamber () and, arranged within the chamber (), a rotating drum () for supporting and transporting the web (), a magnetron device facing the web () supported and transported by the drum () and a gas supply device for supplying a process gas or process gas mixture to the space () between the drum and the magnetron device in which space () the plasma is sustained. The magnetron device has a plurality of independent magnetron electrodes () with rectangular magnetron faces arranged beside each other in parallel. Each magnetron electrode () is individually powered with an alternating voltage by its own power supply (). The drum () is electrically grounded, floating or negatively biased.