The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2010
Filed:
Oct. 07, 2005
Rupert Maier, Eggolsheim, DE;
Ralf Sykosch, Weilersbach, DE;
Rupert Maier, Eggolsheim, DE;
Ralf Sykosch, Weilersbach, DE;
Siemens Aktiengesellschaft, Munich, DE;
Abstract
A method for analyzing technical processes is disclosed, which is characterized in that measuring data of the technical process is generated by at least one decentralized measuring unit, image data associated with a mechanical course of the technical process is produced by at least one decentralized image detection unit, the measuring data stored in the at least one decentralized measuring unit and the image data stored in the at least one image detection unit is provided with a time stamp available to all systems, the measuring and image data are transmitted to a central detection unit where said data is displayed and/or processed in a time-synchronous manner using the time stamp function. Since time stamping is carried out directly in situ, i.e. decentrally in the respective measuring and image detection units, data transmission time required to transmit data to the central detection unit is not critical, so that a time-synchronized display and/or further processing of the measuring and image data can be carried out in the central detection unit with a high degree of accuracy.