The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 2010

Filed:

Mar. 19, 2008
Applicants:

Satoshi Yamaguchi, Kawachinagano, JP;

Yoshiyuki Takata, Toyonaka, JP;

Kaoru Araki, Kyoto, JP;

Inventors:

Satoshi Yamaguchi, Kawachinagano, JP;

Yoshiyuki Takata, Toyonaka, JP;

Kaoru Araki, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract

A chemically amplified resist composition comprising: (A) a salt represented by the formula (I): wherein Rrepresents a C1-C30 hydrocarbon group etc., Qand Qeach independently represent a fluorine atom etc., andArepresents at least one organic cation selected from a cation represented by the formula (Ia): wherein P, Pand Peach independently represent a C1-C30 alkyl group etc.,a cation represented by the formula (Ib): wherein Pand Peach independently represent a hydrogen atom etc., and a cation represented by the formula (Ic): wherein P, P, P, P, P, P, P, P, P, P, Pand Peach independently represent a hydrogen atom etc., B represents a sulfur or oxygen atom and m represents 0 or 1,(B) a salt represented by the formula (II):A'E  (II)wherein A′represents at least one organic cation selected from cations represented by the above-mentioned formulae (Ia), (Ib) and (Ic), and Erepresents at least one organic anion selected from an anion represented by the formula (II-1):OSQ  (II-1)wherein Qrepresents a C1-C10 perfluoroalkyl group, and an anion represented by the formula (II-2): wherein Qrepresents a C1-C10 perfluoroalkyl group, and(C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.


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