The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 28, 2010

Filed:

Apr. 19, 2007
Applicants:

Si-kyoung Kim, Sunnyvale, CA (US);

Sheng Sun, Foster City, CA (US);

John M. White, Hayward, CA (US);

Inventors:

Si-Kyoung Kim, Sunnyvale, CA (US);

Sheng Sun, Foster City, CA (US);

John M. White, Hayward, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B05D 5/04 (2006.01); B05D 5/06 (2006.01); G02F 1/1339 (2006.01); B41J 2/145 (2006.01); B05B 7/06 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method of and apparatus for depositing a spacer on a substrate is provided. The invention includes depositing a first ink including an adhesive agent on a first area of the substrate and depositing a second ink including supporting elements on a second area of the substrate, the second area greater than and encompassing the first area. A portion of the second ink evaporates such that the supporting elements within the second ink migrate into the first area and bond to the adhesive agent in the first ink, forming a spacer. Numerous other aspects are provided.


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