The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2010
Filed:
Jan. 11, 2006
Kelvin W. K. Yeung, Tai Wai, HK;
Ray W. Y. Poon, Kowloon, HK;
Paul Kim-ho Chu, Kowloon, HK;
Kenneth M. C. Cheung, Mid-Levels, HK;
William W. LU, Hong Kong, HK;
Kelvin W. K. Yeung, Tai Wai, HK;
Ray W. Y. Poon, Kowloon, HK;
Paul Kim-Ho Chu, Kowloon, HK;
Kenneth M. C. Cheung, Mid-Levels, HK;
William W. Lu, Hong Kong, HK;
Versitech Limited, Hong Kong, CN;
Abstract
The invention provides a method for making surface treated shape memory materials such as from NiTi alloy using plasma immersion ion implantation and deposition and related ion-beam and plasma-based techniques to alter the surface properties of those materials primarily for biomedical applications. The surfaces are treated with nitrogen, oxygen, and carbon, but become bio-inactive after implanted with other elements such as silicon.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile