The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2010

Filed:

Apr. 07, 2005
Applicants:

Yawara Kaneko, Chigasaki, JP;

Hideyoshi Horimai, Yokohama, JP;

Inventors:

Yawara Kaneko, Chigasaki, JP;

Hideyoshi Horimai, Yokohama, JP;

Assignee:

Optware Corporation, Kanagawa, JP;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03H 1/02 (2006.01); G03H 1/28 (2006.01); G11B 7/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A hologram recording medium including a substrate, a hologram recording layer that records an interference pattern formed by a first wavelength beam, a wavelength selecting reflection layer provided between the substrate and the hologram recording layer that reflects the first wavelength beam and transmits a second wavelength beam, a beam absorbing layer provided between the substrate and the wavelength selecting reflection layer that absorbs the first wavelength beam, and an information layer provided between the substrate and the light absorbing layer in which information is recorded and reproduced by the second wavelength beam, a second information layer provided between the substrate and the information layer and a second wavelength selecting reflection layer provided between the information layer and the second information layer that reflects the second wavelength beam and transmits a third wavelength beam.


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