The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2010

Filed:

Sep. 04, 2008
Applicants:

Vincent Venezia, Sunnyvale, CA (US);

Hsin-chih Tai, Cupertino, CA (US);

Duli Mao, Sunnyvale, CA (US);

Sohei Manabe, San Jose, CA (US);

Howard E. Rhodes, San Martin, CA (US);

Wei Dong Qian, Los Gatos, CA (US);

Inventors:

Vincent Venezia, Sunnyvale, CA (US);

Hsin-Chih Tai, Cupertino, CA (US);

Duli Mao, Sunnyvale, CA (US);

Sohei Manabe, San Jose, CA (US);

Howard E. Rhodes, San Martin, CA (US);

Wei Dong Qian, Los Gatos, CA (US);

Assignee:

OmniVision Technologies, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An array of pixels is formed using a substrate having a frontside and a backside that is for receiving incident light. Each pixel typically includes metallization layers included in the frontside of the substrate, a photosensitive region formed in the backside of the substrate, and a trench formed around the photosensitive region in the backside of the substrate. The trench causes the incident light to be directed away from the trench and towards the photosensitive region.


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