The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2010

Filed:

Jun. 30, 2006
Applicants:

Chun-gi You, Hwaseong-si, KR;

Kyung-min Park, Seongnam-si, KR;

Gyung-soon Park, Yongin-si, KR;

Inventors:

Chun-gi You, Hwaseong-si, KR;

Kyung-min Park, Seongnam-si, KR;

Gyung-soon Park, Yongin-si, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 27/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A thin film transistor (TFT) plate having improved processing efficiency without degradation in performance and a method of fabricating the TFT plate are provided. The TFT plate includes gate insulating layer patterns made of dual layers. Upper portions of both sidewalls of an upper gate insulating layer pattern are substantially aligned with both sidewalls of a gate electrode. Lower portions of both sidewalls of the upper gate insulating layer pattern are substantially aligned with a boundary portion between a lightly doped region and a source region and a boundary portion between the lightly doped region and a drain region. Thus, the concentration of the lightly doped region under a lower gate insulating layer pattern gradually changes.


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