The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Apr. 17, 2007
Yinan Chen, Taipei, TW;
Yinan Chen, Taipei, TW;
Nanya Technology Corp., , TW;
Abstract
A method of manufacturing a contact structure to avoid open issue is provided. The method includes the steps of providing a substrate with a contact region, forming an insulating layer to cover the substrate, forming a contact hole in the insulating layer to expose the contact region, conformally depositing a titanium layer on the insulating layer, conformally depositing a titanium nitride layer on the titanium layer, and performing a plasma process on the titanium nitride layer to remove the impurities in the titanium nitride layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile