The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2010

Filed:

Aug. 31, 2004
Applicant:

Luigi Capodieci, Santa Cruz, CA (US);

Inventor:

Luigi Capodieci, Santa Cruz, CA (US);

Assignee:

GlobalFoundries Inc., Grand Cayman, KY;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G21K 5/10 (2006.01); G03C 5/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of forming a feature on a device is disclosed. A photo resist layer is formed over the device and a dipole illuminator having a pole orientation axis in a first direction is used to expose a first geometrical pattern onto the resist layer. The first geometrical pattern is substantially oriented in the same direction as the pole orientation axis of the dipole illuminator. A dipole illuminator having a pole orientation axis substantially orthogonal to the first direction then is used to expose a second geometrical pattern onto the resist layer. The second geometrical pattern is oriented substantially orthogonal to the first direction.


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