The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Apr. 30, 2007
Kuo-yao Cho, Taipei, TW;
Jen-jui Huang, Taipei, TW;
Kuo-Yao Cho, Taipei, TW;
Jen-Jui Huang, Taipei, TW;
Nanya Technology Corp., Taiwan, CN;
Abstract
A method for forming a ring pattern is disclosed. The ring pattern has a first wall and a second wall. The method includes the following steps: (a) providing a substrate; (b) forming a dielectric layer on the substrate; (c) forming a first patterned photoresist layer on the dielectric layer, the first patterned photoresist layer defining the first wall; (d) etching the dielectric layer to a predetermined depth by using the first patterned photoresist as a mask, and then removing the first patterned photoresist layer; (e) forming a second patterned photoresist layer on the dielectric layer, the second patterned photoresist layer defining the second wall; (f) etching the dielectric layer by using the second patterned photoresist layer as a mask so as to form the ring pattern having the first wall and the second wall.