The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Nov. 21, 2006
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Alois Gutmann, Poughkeepsie, NY (US);
Henning Haffner, Pawling, NY (US);
Sajan Marokkey, Wappingers Falls, NY (US);
Josef Maynollo, Wappingers Falls, NY (US);
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Alois Gutmann, Poughkeepsie, NY (US);
Henning Haffner, Pawling, NY (US);
Sajan Marokkey, Wappingers Falls, NY (US);
Josef Maynollo, Wappingers Falls, NY (US);
Infineon Technologies AG, Neubiberg, DE;
Abstract
Lithography masks and methods of manufacture thereof are disclosed. A preferred embodiment comprises a method of manufacturing a lithography mask. The method includes providing a substrate, forming a first pattern in a first region of the substrate, and forming a second pattern in a second region of the substrate, the second pattern comprising patterns for features oriented differently than patterns for features of the first pattern. The method includes affecting a polarization rotation of light differently in the first region than in the second region of the substrate.