The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2010

Filed:

Feb. 14, 2006
Applicants:

Justin Payne, Blackburn, GB;

David Ponton, Blackburn, GB;

John Jeffery, Blackburn, GB;

Arved Westerkamp, Dettingen/Ems, DE;

Antony Morton, Illeley, GB;

Inventors:

Justin Payne, Blackburn, GB;

David Ponton, Blackburn, GB;

John Jeffery, Blackburn, GB;

Arved Westerkamp, Dettingen/Ems, DE;

Antony Morton, Illeley, GB;

Assignee:

Voith Paper Patent GmbH, Heidenheim, DE;

Attorney:
Int. Cl.
CPC ...
B05D 1/28 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for producing a topographical pattern on or in a papermachine fabric. The method for creating the pattern on or in an fabric, includes producing a topographical polymer pattern on or in a papermachine fabric using a rotary screen. The instant abstract is neither intended to define the invention disclosed in this specification nor intended to limit the scope of the invention in any way.


Find Patent Forward Citations

Payne, Justin. (2010). Method for producing topographical pattern on papermachine fabric by rotary screen printing of polymeric material (U.S. Patent No. 7799382). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7799382

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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