The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 21, 2010

Filed:

Aug. 11, 2004
Applicants:

Thomas Wahl, Pforzheim, DE;

Harald Guenschel, Gerach, DE;

Berthold Ficker, Bamberg, DE;

Inventors:

Thomas Wahl, Pforzheim, DE;

Harald Guenschel, Gerach, DE;

Berthold Ficker, Bamberg, DE;

Assignee:

Robert Bosch GmbH, Stuttgart, DE;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01N 27/26 (2006.01);
U.S. Cl.
CPC ...
Abstract

A sensor element to determine the temperature or the oxygen concentration of an exhaust gas of an internal combustion engine includes a first solid electrolyte film, a second solid electrolyte film, and a diffusion barrier disposed in a layer plane between the first and the second solid electrolyte film. A gas-impermeable or at least largely gas-impermeable cover layer is provided locally on the diffusion barrier, so that in the regions in which the cover layer is provided on the diffusion barrier, diffusion of the measured gas into or out of the diffusion barrier is at least largely prevented. A corresponding method for manufacturing a sensor element includes ablating a diffusion barrier using a laser in order to adjust the diffusion resistance of the diffusion barrier. A cover layer that, after a sintering process, is gas-impermeable or at least largely gas-impermeable is applied onto a side of the diffusion barrier that faces toward a measured gas located outside the sensor element. The cover layer is ablated in order to adjust the diffusion resistance of the diffusion barrier.


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