The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Dec. 13, 2007
John N. Randall, Richardson, TX (US);
Jingping Peng, Plano, TX (US);
Jun-fu Liu, Newmarket, NH (US);
George D. Skidmore, Richardson, TX (US);
Christof Baur, Dallas, TX (US);
Richard E. Stallcup, Little Elm, TX (US);
Robert J. Folaron, Plano, TX (US);
John N. Randall, Richardson, TX (US);
Jingping Peng, Plano, TX (US);
Jun-Fu Liu, Newmarket, NH (US);
George D. Skidmore, Richardson, TX (US);
Christof Baur, Dallas, TX (US);
Richard E. Stallcup, Little Elm, TX (US);
Robert J. Folaron, Plano, TX (US);
Zyvex Labs, LLC, Richardson, TX (US);
Abstract
A patterned layer is formed by removing nanoscale passivating particle from a first plurality of nanoscale structural particles or by adding nanoscale passivating particles to the first plurality of nanoscale structural particles. Each of a second plurality of nanoscale structural particles is deposited on each of corresponding ones of the first plurality of nanoscale structural particles that is not passivated by one of the plurality of nanoscale passivating particles.