The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Sep. 08, 2005
Applicant:
David A. Luce, Clarence Center, NY (US);
Inventor:
David A. Luce, Clarence Center, NY (US);
Assignee:
Reichert, Inc., Depew, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61B 3/16 (2006.01); A61B 13/00 (2006.01); A61B 5/103 (2006.01); A61B 5/117 (2006.01); A61B 3/00 (2006.01); A61B 3/10 (2006.01); A61B 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method and apparatus for measuring corneal resistance to deformation use an empirically derived function wherein an inward applanation pressure Pand an outward applanation pressure Pobtained during a corneal deformation cycle caused by a fluid pulse are separately weighted so as to minimize dependence of the calculated corneal resistance factor (CRF) on intraocular pressure. In one embodiment, the function is optimized, at least in part, to maximize statistical correlation between the calculated corneal resistance factor (CRF) and central corneal thickness.