The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 21, 2010
Filed:
Nov. 10, 2009
W. Karl Olander, Indian Shores, FL (US);
Matthew B. Donatucci, Bethel, CT (US);
Luping Wang, Brookfield, CT (US);
Michael J. Wodjenski, New Milford, CT (US);
W. Karl Olander, Indian Shores, FL (US);
Matthew B. Donatucci, Bethel, CT (US);
Luping Wang, Brookfield, CT (US);
Michael J. Wodjenski, New Milford, CT (US);
Advanced Technology Materials, Inc., Danbury, CT (US);
Abstract
Apparatus and method for dispensing a gas using a gas source coupled in selective flow relationship with a gas manifold. The gas manifold includes flow circuitry for discharging gas to a gas-using zone, and the gas source includes a pressure-regulated gas source vessel containing the gas at superatmospheric pressure. The pressure-regulated gas source vessel can be arranged with a pressure regulator at or within the vessel and a flow control valve coupled in flow relationship to the vessel, so that gas dispensed from the vessel flows through the regulator prior to flow through the flow control valve, and into the gas manifold. The apparatus and method permit an enhancement of the safety of storage and dispensing of toxic or otherwise hazardous gases used in semiconductor processes.