The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Sep. 14, 2010

Filed:

Jan. 05, 2006
Applicants:

Heon Kim, Yeosu, KR;

Sung Ho Chun, Daejeon, KR;

Keon Woo Lee, Daejeon, KR;

Sung Joon OH, Daejeon, KR;

Kyungjun Kim, Daejeon, KR;

Jungho JO, Suwon, KR;

Byung Hyun Lee, Daejeon, KR;

Min Young Lim, Seongnam, KR;

Hye Won Jeong, Daejeon, KR;

Inventors:

Heon Kim, Yeosu, KR;

Sung Ho Chun, Daejeon, KR;

Keon Woo Lee, Daejeon, KR;

Sung Joon Oh, Daejeon, KR;

Kyungjun Kim, Daejeon, KR;

Jungho Jo, Suwon, KR;

Byung Hyun Lee, Daejeon, KR;

Min Young Lim, Seongnam, KR;

Hye Won Jeong, Daejeon, KR;

Assignee:

LG Chem, Ltd., Seoul, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 61/06 (2006.01); C08F 32/08 (2006.01); C08F 4/80 (2006.01); C07C 13/42 (2006.01);
U.S. Cl.
CPC ...
Abstract

Provided are a photoreactive polymer that includes a multi-cyclicmulticyclic compound at as its main chain and a method of preparing the same. The photoreactive polymer exhibits excellent thermal stability since it includes a multi-cyclicmulticyclic compound having a high glass transition temperature at as its main chain. In addition, the photoreactive polymer has a relatively large vacancy so that a photoreactive group can move relatively freely in the main chain therein. As a result, a slow photoreaction rate, which is a disadvantage of a conventional polymer material used to form an alignment layer for a liquid crystal display device, can be overcome.


Find Patent Forward Citations

Kim, Heon. (2010). Photoreactive polymer and process of making the same (U.S. Patent No. 7795361). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7795361

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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